Engineers Discover Ultra-Thin Materials That Outdo Silicon

Published Date : Aug 14, 2017

Electric engineers of the Stanford University have recognized two semiconductors that showcase traits like Silicon-and have the potential to exceed the material in the same factors. Hafnium diselenide and zirconium diselenide that mirrors some of Silicon’s characteristics such as its ability to rust in a desirable way, are super-thin and have the impeccable range of band gap energy required to switch transistors on. Silicon transistors are being tested to be manufactured to be as thin as 5 nanometers, and even smaller. However, the material properties begin to change in undesirable fashion. The new diselenides, while having the ability to be molded into just two-thirds of a nanometer, showcase robust properties.

Yet on an experimental basis, the researchers believe that the diselenides could prove to be a step forward toward highly efficient chips, as will be the demand of the future. Semiconductors with lower threshold energy could result in unstable circuits, and this could lead to larger power power consumption and circuit unreliability. There is more research to be done on the subject, as reported by the analysts. Refinement of electrical contacts and better control of the oxidized insulators is still pending and is expected to help in the integration of other materials. Researchers predict that until this work is underway, Silicon still has a stable demand over time.